Invention Grant
- Patent Title: Electrostatic discharge protection structure
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Application No.: US15705017Application Date: 2017-09-14
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Publication No.: US10937782B2Publication Date: 2021-03-02
- Inventor: Dolphin Abessolo Bidzo , Janusz Tomasz Klimczak , Detlef Clawin , Radu Mircea Secareanu
- Applicant: NXP B.V.
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H02H9/04 ; H01L27/06 ; H01L23/66 ; H01L23/522 ; H01L49/02

Abstract:
An electrostatic discharge, ESD, protection structure (200) formed within a semiconductor substrate of an integrated circuit device (600). The integrated circuit device (600) comprising: a radio frequency domain (632); a digital domain (610). The ESD protection structure (200) further includes an intermediate domain located between the radio frequency domain (632) and the digital domain (610) that comprises at least one radio frequency, RF, passive or active device that exhibits an impedance characteristic that increases as a frequency of operation increases.
Public/Granted literature
- US20190081037A1 ELECTROSTATIC DISCHARGE PROTECTION STRUCTURE Public/Granted day:2019-03-14
Information query
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