Invention Grant
- Patent Title: Magnetoresistance effect element
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Application No.: US15911689Application Date: 2018-03-05
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Publication No.: US10937951B2Publication Date: 2021-03-02
- Inventor: Katsuyuki Nakada , Kazuumi Inubushi
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JPJP2017-040819 20170303
- Main IPC: H01F10/193
- IPC: H01F10/193 ; H01F10/32 ; H01L43/10 ; H01F1/00 ; H01L43/08

Abstract:
A magnetoresistance effect element according to an aspect of the present disclosure includes a first ferromagnetic layer as a magnetization fixed layer including a ferromagnetic Heusler alloy, a second ferromagnetic layer as a magnetization free layer including a ferromagnetic Heusler alloy, and a nonmagnetic spacer layer provided between the first ferromagnetic layer and the second ferromagnetic layer, and the nonmagnetic spacer layer includes a nonmagnetic Fe group, Co group, or Ni group Heusler alloy.
Public/Granted literature
- US20180254409A1 MAGNETORESISTANCE EFFECT ELEMENT Public/Granted day:2018-09-06
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