Invention Grant
- Patent Title: Manufacturing techniques and corresponding devices for magnetic tunnel junction devices
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Application No.: US16587430Application Date: 2019-09-30
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Publication No.: US10937957B2Publication Date: 2021-03-02
- Inventor: Harry-Hak-Lay Chuang , Hung Cho Wang , Tien-Wei Chiang , Wen-Chun You
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L29/82
- IPC: H01L29/82 ; H01L43/12 ; H01L27/22 ; H01L43/08

Abstract:
Some embodiments relate to a magnetoresistive random-access memory (MRAM) cell. The cell includes a bottom electrode having a central bottom electrode portion surrounded by a peripheral bottom electrode portion. Step regions of the conductive bottom electrode couple the central and peripheral bottom electrode portions to one another such that an upper surface of the central portion is recessed relative to an upper surface of the peripheral portion. A magnetic tunneling junction (MTJ) has MTJ outer sidewalls which are disposed over the bottom central electrode portion and which are arranged between the step regions. A top electrode is disposed over an upper surface of the MTJ. Other devices and methods are also disclosed.
Public/Granted literature
- US20200028072A1 MANUFACTURING TECHNIQUES AND CORRESPONDING DEVICES FOR MAGNETIC TUNNEL JUNCTION DEVICES Public/Granted day:2020-01-23
Information query
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