Invention Grant
- Patent Title: Method for preparing an organic semiconductor layer and an organic electronic device
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Application No.: US16329018Application Date: 2017-08-30
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Publication No.: US10937966B2Publication Date: 2021-03-02
- Inventor: Steffen Runge , Carsten Rothe , Julien Frey , Uwe Gölfert
- Applicant: Novaled GmbH
- Applicant Address: DE Dresden
- Assignee: Novaled GmbH
- Current Assignee: Novaled GmbH
- Current Assignee Address: DE Dresden
- Agency: Eversheds Sutherland (US) LLP
- Priority: EP16186262 20160830
- International Application: PCT/EP2017/071709 WO 20170830
- International Announcement: WO2018/041864 WO 20180308
- Main IPC: H01L51/00
- IPC: H01L51/00 ; H01L51/50 ; H01L51/56 ; C23C14/12 ; C23C14/24 ; C23C14/00

Abstract:
The present invention relates to a method for preparing an organic semiconductor layer in a vacuum chamber at a pressure of 10−5 to 10−9 mbar comprising a step of sublimating a composition from a single vacuum thermal evaporation source arranged in the vacuum chamber, wherein the composition comprises a physical mixture of (a) a first organic aromatic matrix compound having a molecular weight ≥400 and ≤1,000: and (b) a first alkali organic complex having a molecular weight of ≥100 and ≤400.
Public/Granted literature
- US20190207116A1 Method for Preparing an Organic Semiconductor Layer and an Organic Electronic Device Public/Granted day:2019-07-04
Information query
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