Invention Grant
- Patent Title: Surfactant composition
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Application No.: US16334203Application Date: 2017-08-22
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Publication No.: US10940453B2Publication Date: 2021-03-09
- Inventor: Masatake Joyabu , Kei Shiohara , Asako Ogasawara , Takuro Kimura , Chi Tao
- Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
- Current Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2016-191121 20160929
- International Application: PCT/JP2017/029970 WO 20170822
- International Announcement: WO2018/061533 WO 20180405
- Main IPC: C08F2/26
- IPC: C08F2/26 ; C08F2/30 ; B01F17/00 ; C08L71/02 ; C09D7/45 ; C09J11/08 ; D21H17/53 ; D21H17/36 ; D21H21/08 ; C08F2/24 ; C08K5/06 ; C08F20/00

Abstract:
The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.
Public/Granted literature
- US20190217265A1 SURFACTANT COMPOSITION Public/Granted day:2019-07-18
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