Invention Grant
- Patent Title: Method of manufacturing an ink-jet printhead
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Application No.: US15557354Application Date: 2016-03-10
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Publication No.: US10940690B2Publication Date: 2021-03-09
- Inventor: Lucia Giovanola , Silvia Baldi , Anna Merialdo , Paolo Schina
- Applicant: SICPA HOLDING SA
- Applicant Address: CH Prilly
- Assignee: SICPA HOLDING SA
- Current Assignee: SICPA HOLDING SA
- Current Assignee Address: CH Prilly
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: EP15160524 20150324
- International Application: PCT/EP2016/055126 WO 20160310
- International Announcement: WO2016/150715 WO 20160929
- Main IPC: B41J2/16
- IPC: B41J2/16 ; B41J2/14

Abstract:
The present application relates to a method of manufacturing an ink-jet printhead comprising: providing a silicon substrate (10) including active ejecting elements (11); providing a hydraulic structure layer (20) for defining hydraulic circuits configured to enable a guided flow of ink; providing a silicon orifice plate (30) having a plurality of nozzles (31) for ejection of the ink; assembling the silicon substrate (10) with the hydraulic structure layer (20) and the silicon orifice plate (30); wherein providing the silicon orifice plate (30) comprises: providing a silicon wafer (40) having a planar extension delimited by a first surface (41) and a second surface (42) on opposite sides of the silicon wafer (40); performing a thinning step at the second surface (42) so as to remove from the second surface (42) a central portion (43) having a preset height (H), the silicon wafer (40) being formed, following the thinning step, by a base portion (44) having a planar extension and a peripheral portion (45) extending from the base portion (44), transversally with respect to the planar extension of the base portion (44); and forming in the silicon wafer (40) a plurality of through holes, each defining a respective nozzle (31) for ejection of the ink. The method according to the present invention is characterized in that the silicon wafer (40) is a silicon-on-insulator wafer, wherein the silicon-on-insulator wafer comprises a silicon device layer (38) adjacent to the first surface (41), a silicon handle layer (37) adjacent to the second surface (42) and an insulator layer (39) in-between.
Public/Granted literature
- US20180236767A1 METHOD OF MANUFACTURING AN INK-JET PRINTHEAD Public/Granted day:2018-08-23
Information query
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