Invention Grant
- Patent Title: Exposure machine and method of transferring a substrate of same
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Application No.: US16347817Application Date: 2019-04-15
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Publication No.: US10941011B2Publication Date: 2021-03-09
- Inventor: Wei Wang
- Applicant: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Wuhan
- Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Wuhan
- Priority: CN201811094615.X 20180919
- International Application: PCT/CN2019/082629 WO 20190415
- International Announcement: WO2020/057114 WO 20200326
- Main IPC: B65H5/08
- IPC: B65H5/08 ; H01L21/677

Abstract:
An exposure machine includes a base portion, a port portion, and a conveying structure. The base portion includes a work table and a bearing frame. The bearing frame is disposed on the work table and is configured to carry a tray. The port portion is configured to serve as a feed port and a discharge port of the exposure machine. The conveying structure includes at least one upper arm, at least one lower arm, and a movable tray guide. The movable tray guide is connected to the base portion and the port portion. The at least one lower arm is provided with a hook configured to hook the tray and move the tray to the port portion.
Public/Granted literature
- US20200247631A1 EXPOSURE MACHINE AND METHOD OF TRANSFERRING A SUBSTRATE OF SAME Public/Granted day:2020-08-06
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