- Patent Title: Antistatic material, method for producing same, and antistatic film
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Application No.: US16076012Application Date: 2017-02-17
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Publication No.: US10941250B2Publication Date: 2021-03-09
- Inventor: Kei Toyota , Kazuma Oikawa
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JPJP2016-048771 20160311
- International Application: PCT/JP2017/005864 WO 20170217
- International Announcement: WO2017/154515 WO 20170914
- Main IPC: C09K3/16
- IPC: C09K3/16 ; C08G77/20 ; C08G77/18 ; C08J5/18 ; C08K3/16 ; C08G77/04 ; C08G59/20 ; C09D183/06 ; C08G77/14
Abstract:
Provided is an antistatic material that contains a mixture of first alkoxysilane that contains at least one alkoxy group and at least one polymerizable organic functional group, second alkoxysilane that contains at least one alkoxy group and does not contain a polymerizable organic functional group, a solvent, an acidic catalyst, and an ionic compound.
Public/Granted literature
- US20190256661A1 ANTISTATIC MATERIAL, METHOD FOR PRODUCING SAME, AND ANTISTATIC FILM Public/Granted day:2019-08-22
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