Invention Grant
- Patent Title: Substrate processing apparatus and susceptor
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Application No.: US16710486Application Date: 2019-12-11
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Publication No.: US10941477B2Publication Date: 2021-03-09
- Inventor: Satoshi Taga , Yoshiyuki Kobayashi
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: IPUSA, PLLC
- Priority: JP2013-010855 20130124,JP2013-048172 20130311
- Main IPC: H01L21/687
- IPC: H01L21/687 ; C23C4/08 ; C23C16/458 ; H01L21/683
Abstract:
A susceptor for receiving a substrate, the susceptor including a ceramics base member, a conductive layer formed on a top surface of the ceramics base member and a side surface of the ceramics base member, the top surface of the ceramics base member configured to receive and support the substrate, and a conducting member contacting the conductive layer at an outer surface of the ceramics base member.
Information query
IPC分类:
