Invention Grant
- Patent Title: Reflection preventing film and method for manufacturing same, and reflection preventing layer- attached polarization plate
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Application No.: US16309256Application Date: 2017-06-16
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Publication No.: US10942295B2Publication Date: 2021-03-09
- Inventor: Kodai Miyamoto , Minoru Kanatani , Tomotake Nashiki
- Applicant: NITTO DENKO CORPORATION
- Applicant Address: JP Ibaraki
- Assignee: NITTO DENKO CORPORATION
- Current Assignee: NITTO DENKO CORPORATION
- Current Assignee Address: JP Ibaraki
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2016-120947 20160617,JP2017-117666 20170615
- International Application: PCT/JP2017/022267 WO 20170616
- International Announcement: WO2017/217526 WO 20171221
- Main IPC: G02B1/115
- IPC: G02B1/115 ; G02B1/14 ; B32B7/023 ; B32B27/08 ; B32B27/30 ; C23C14/00 ; C23C14/35 ; G02B5/30 ; G02B1/18 ; C23C14/08

Abstract:
The anti-reflection film includes an anti-reflection layer composed of multilayer thin-films having different refractive indexes on one principal surface of a transparent film substrate. The moisture permeability of the anti-reflection film is 15 to 1000 g/m2·24 h. The surface of the anti-reflection layer has an indentation elastic modulus of 20 to 100 GPa, and an arithmetic mean roughness Ra of 3 nm or less. The arithmetic mean roughness Ra of the surface of the anti-reflection layer is preferably 1.5 nm or less. The thin-films constituting the anti-reflection layer can be deposited by, for example, a sputtering method.
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