Invention Grant
- Patent Title: Repatternable nanoimprint lithography stamp
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Application No.: US16380340Application Date: 2019-04-10
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Publication No.: US10942448B2Publication Date: 2021-03-09
- Inventor: Brandon M. Kobilka , Joseph Kuczynski , Jason T. Wertz
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Peter Edwards
- Main IPC: B32B3/00
- IPC: B32B3/00 ; G03F7/00 ; H01F41/30 ; H01F1/00

Abstract:
A repatternable nanoimprint lithography stamp includes a magnetic substrate and magnetic core nanoparticles. The magnetic substrate includes a magnet and a magnetic mask, and the magnetic core nanoparticles are arranged in a pattern on a surface of the magnetic substrate. The pattern is defined by selective application of a magnetic field to the magnetic substrate using the magnet and the magnetic mask.
Public/Granted literature
- US20190235379A1 REPATTERNABLE NANOIMPRINT LITHOGRAPHY STAMP Public/Granted day:2019-08-01
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