Invention Grant
- Patent Title: Semiconductor device including standard-cell-adapted power grid arrangement and method for generating layout diagram of same
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Application No.: US16222855Application Date: 2018-12-17
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Publication No.: US10943045B2Publication Date: 2021-03-09
- Inventor: Hiranmay Biswas , Chung-Hsing Wang , Chin-Shen Lin , Kuo-Nan Yang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; H01L23/52 ; G06F30/392 ; H01L23/522 ; H01L23/532 ; H01L23/528 ; G06F30/3947 ; G06F30/3953

Abstract:
A semiconductor device includes: a power grid (PG) arrangement including: a conductive layer M(i) including segments which are conductive, where i is an integer and i≥0; and a conductive layer M(i+1) over the conductive layer M(i), the conductive layer M(i+1) including segments which are conductive; the M(i) segments including first and second segments designated correspondingly for first and second reference voltages, the first and second segments being interspersed and substantially parallel to a first direction; and the segments in the conductive layer M(i+1) including third and fourth segments designated correspondingly for the first and second reference voltages; the third and fourth segments being interspersed and substantially parallel to a perpendicular second direction; and wherein the segments in the conductive layer M(i+1) are arranged substantially asymmetrically such that each fourth segment is located, relative to the first direction, substantially asymmetrically between corresponding adjacent ones of the third segments.
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