Invention Grant
- Patent Title: Monitoring of process chamber
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Application No.: US16454619Application Date: 2019-06-27
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Publication No.: US10943804B2Publication Date: 2021-03-09
- Inventor: Bo-Chen Chen , Sheng-Wei Wu , Yung-Li Tsai
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: H01L21/67
- IPC: H01L21/67 ; G06T7/00 ; G01N21/95 ; G01N21/956

Abstract:
The present disclosure describes a method for controlling a wet processing system includes dispensing one or more chemicals into a processing chamber according to one or more process parameters. The method also includes injecting one or more illumination markers into the processing chamber and obtaining images representing locations of the one or more illumination markers. The method further includes determining a trajectory of an illumination marker of the one or more illumination markers based on the images and determining whether the determined trajectory is outside a predetermined trajectory range. In response to the determined trajectory being outside the predetermined trajectory range, the method further includes adjusting the one or more process parameters.
Public/Granted literature
- US20200006101A1 MONITORING OF PROCESS CHAMBER Public/Granted day:2020-01-02
Information query
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