Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16513826Application Date: 2019-07-17
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Publication No.: US10944014B2Publication Date: 2021-03-09
- Inventor: Shunpei Yamazaki , Akihisa Shimomura , Yuhei Sato , Yasumasa Yamane , Yoshitaka Yamamoto , Hideomi Suzawa , Tetsuhiro Tanaka , Yutaka Okazaki , Naoki Okuno , Takahisa Ishiyama
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi
- Agency: Fish & Richardson P.C.
- Priority: JPJP2013-262873 20131219
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/417

Abstract:
To provide a transistor having a high on-state current. A semiconductor device includes a first insulator containing excess oxygen, a first oxide semiconductor over the first insulator, a second oxide semiconductor over the first oxide semiconductor, a first conductor and a second conductor which are over the second oxide semiconductor and are separated from each other, a third oxide semiconductor in contact with side surfaces of the first oxide semiconductor, a top surface and side surfaces of the second oxide semiconductor, a top surface of the first conductor, and a top surface of the second conductor, a second insulator over the third oxide semiconductor, and a third conductor facing a top surface and side surfaces of the second oxide semiconductor with the second insulator and the third oxide semiconductor therebetween. The first oxide semiconductor has a higher oxygen-transmitting property than the third oxide semiconductor.
Public/Granted literature
- US20190341495A1 SEMICONDUCTOR DEVICE Public/Granted day:2019-11-07
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