Invention Grant
- Patent Title: MRAM structure with T-shaped bottom electrode to overcome galvanic effect
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Application No.: US16534609Application Date: 2019-08-07
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Publication No.: US10944044B2Publication Date: 2021-03-09
- Inventor: Pouya Hashemi , Bruce B. Doris , Eugene J. O'Sullivan , Michael F. Lofaro
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P C.
- Agent Daniel P. Morris, Esq.
- Main IPC: H01L43/08
- IPC: H01L43/08 ; H01L43/02 ; H01L27/22 ; H01L43/12

Abstract:
A memory structure is provided that avoids high resistance due to the galvanic effect. The high resistance is reduced and/or eliminated by providing a T-shaped bottom electrode structure of uniform construction (i.e., a single piece). The T-shaped bottom electrode structure includes a narrow base portion and a wider shelf portion. The shelf portion of the T-shaped bottom electrode structure has a planar topmost surface in which a MTJ pillar forms an interface with.
Public/Granted literature
- US20210043827A1 MRAM STRUCTURE WITH T-SHAPED BOTTOM ELECTRODE TO OVERCOME GALVANIC EFFECT Public/Granted day:2021-02-11
Information query
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