Invention Grant
- Patent Title: Method for producing a light source and light source
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Application No.: US16690193Application Date: 2019-11-21
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Publication No.: US10944235B2Publication Date: 2021-03-09
- Inventor: Vincent Reboud , Georgio El Zammar , Rami Khazaka , Sylvie Menezo
- Applicant: Commissariat A L'Energie Atomique et aux Energies Alternatives
- Applicant Address: FR Paris
- Assignee: Commissariat A L'Energie Atomique et aux Energies Alternatives
- Current Assignee: Commissariat A L'Energie Atomique et aux Energies Alternatives
- Current Assignee Address: FR Paris
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR1871722 20181122
- Main IPC: H01S5/00
- IPC: H01S5/00 ; H01S5/02 ; H01S5/30 ; H01S5/32 ; H01S5/40 ; H01S5/0625 ; H01S5/10

Abstract:
A light source comprises a GeSn active zone inserted between two contact zones. The active zone is formed directly on a silicon oxide layer by a first lateral epitaxial growth of a Ge germination layer followed by a second lateral epitaxial growth of a GeSn base layer. A cavity is formed between the contact zones by encapsulation and etching, so as to guide these lateral growths. A vertical growth of GeSn is then achieved from the base layer to form a structural layer. The active zone is formed in the stack of base and structural layers.
Public/Granted literature
- US20200227894A1 METHOD FOR PRODUCING A LIGHT SOURCE AND LIGHT SOURCE Public/Granted day:2020-07-16
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