Invention Grant
- Patent Title: Electrostatic doping of a layer of a conductive or non-conductive material
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Application No.: US15747564Application Date: 2016-07-27
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Publication No.: US10947152B2Publication Date: 2021-03-16
- Inventor: Abhay Shukla , Johan Biscaras , Andrea Paradisi
- Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE , UNIVERSITE PIERRE ET MARIE CURIE (PARIS 6)
- Applicant Address: FR Paris; FR Paris
- Assignee: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE,UNIVERSITE PIERRE ET MARIE CURIE (PARIS 6)
- Current Assignee: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE,UNIVERSITE PIERRE ET MARIE CURIE (PARIS 6)
- Current Assignee Address: FR Paris; FR Paris
- Agency: IPSILON USA, LLP
- Priority: FR1557308 20150730
- International Application: PCT/FR2016/051942 WO 20160727
- International Announcement: WO2017/017372 WO 20170202
- Main IPC: C03C17/245
- IPC: C03C17/245 ; C03C17/22 ; C03C17/23 ; H01L31/18 ; H01L31/028 ; H01L31/032 ; H01L31/0224 ; H01B13/00 ; H01L39/24
Abstract:
The invention relates to a process for permanently electrostatically doping a layer of a conductive or non-conductive material that is deposited on a solid substrate, to the doped material obtained according to this process, and to the use of such a material.
Public/Granted literature
- US20180215658A1 ELECTROSTATIC DOPING OF A LAYER OF A CONDUCTIVE OR NON-CONDUCTIVE MATERIAL Public/Granted day:2018-08-02
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