Invention Grant
- Patent Title: Mask and control method and use method thereof
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Application No.: US16171195Application Date: 2018-10-25
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Publication No.: US10948815B2Publication Date: 2021-03-16
- Inventor: Yue Geng , Peizhi Cai , Fengchun Pang , Le Gu , Chuncheng Che
- Applicant: Beijing BOE Optoelectronics Technology Co., Ltd. , BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing; CN Beijing
- Assignee: Beijing BOE Optoelectronics Technology Co., Ltd.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: Beijing BOE Optoelectronics Technology Co., Ltd.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing; CN Beijing
- Agency: Thomas|Horstemeyer, LLP
- Priority: CN201810291456.6 20180403
- Main IPC: G03F1/38
- IPC: G03F1/38 ; G03F7/20 ; G03F1/50

Abstract:
The present disclosure discloses a mask, which includes a first substrate and a second substrate. The mask further includes a polarity particle positioned between the first substrate and the second substrate. The polarity particle has a light absorption or light transmission effect. The first substrate includes a plurality of driving electrodes disposed toward the second substrate and arranged in an array. Each of the driving electrodes is configured to receive an electric signal and control the polarity particle to move to a designated driving electrode to form a pattern.
Public/Granted literature
- US20190302605A1 MASK AND CONTROL METHOD AND USE METHOD THEREOF Public/Granted day:2019-10-03
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