An imprint apparatus forms a pattern on a substrate by bringing a pattern region of a mold into contact with imprint material on the substrate and curing the imprint material. The mold has first and second surfaces. The first surface includes the pattern region and a peripheral region surrounding the pattern region. The second surface includes a held region. The imprint apparatus includes a mold driving mechanism to hold the held region of the mold and drive the mold, a mold conveyance mechanism to hold the peripheral region of the mold and convey the mold, and a controller to control the mold conveyance mechanism based on thickness between the peripheral region and the held region.