Invention Grant
- Patent Title: Pattern forming apparatus, alignment mark detection method, and pattern forming method
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Application No.: US16284751Application Date: 2019-02-25
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Publication No.: US10948829B2Publication Date: 2021-03-16
- Inventor: Naoki Funabashi
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JPJP2018-035313 20180228
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00
Abstract:
A pattern forming apparatus configured to form a pattern on a substrate includes a holding portion configured to hold the substrate by suction, an optical system configured to detect, from a suction surface side of the substrate, an alignment mark provided to the substrate held by the holding portion, and a unit configured to shield light entering the optical system.
Public/Granted literature
- US20190265595A1 PATTERN FORMING APPARATUS, ALIGNMENT MARK DETECTION METHOD, AND PATTERN FORMING METHOD Public/Granted day:2019-08-29
Information query
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