Invention Grant
- Patent Title: Wafer holding device and projection microlithography system
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Application No.: US16823790Application Date: 2020-03-19
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Publication No.: US10948833B2Publication Date: 2021-03-16
- Inventor: Rolf Freimann
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Edell, Shapiro & Finnan, LLC
- Priority: DE102017216679.7 20170920
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A wafer holding device (200, 415) is configured to hold a wafer (205, 416) during operation of a microlithographic projection exposure apparatus and includes at least one sensor that is positionable in different rotational positions.
Public/Granted literature
- US20200218163A1 WAFER HOLDING DEVICE AND PROJECTION MICROLITHOGRAPHY SYSTEM Public/Granted day:2020-07-09
Information query
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