Invention Grant
- Patent Title: Vertical memory devices
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Application No.: US16419204Application Date: 2019-05-22
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Publication No.: US10950624B2Publication Date: 2021-03-16
- Inventor: Seok-Cheon Baek , Ji-Ye Noh , Yoon-Hwan Son , Ji-Sung Cheon
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2018-0157921 20181210
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/11565 ; H01L29/423 ; H01L29/10

Abstract:
A vertical memory device includes gate electrodes on a substrate and a channel. The gate electrodes are spaced apart from each other in a vertical direction substantially perpendicular to an upper surface of the substrate. The channel extends through the gate electrodes, and includes a first portion, a second portion and a third portion. The second portion is formed on and connected to the first portion, and has a sidewall slanted with respect to the upper surface of the substrate so as to have a width gradually decreasing from a bottom toward a top thereof. The third portion is formed on and connected to the second portion.
Public/Granted literature
- US20200185409A1 VERTICAL MEMORY DEVICES Public/Granted day:2020-06-11
Information query
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