• Patent Title: Guide pin, photo mask supporting unit including the same, and photo mask cleaning apparatus including the same
  • Application No.: US16658215
    Application Date: 2019-10-21
  • Publication No.: US10955758B2
    Publication Date: 2021-03-23
  • Inventor: Shi Hyun Park
  • Applicant: SEMES CO., LTD.
  • Applicant Address: KR Chungcheongnam-do
  • Assignee: SEMES CO., LTD.
  • Current Assignee: SEMES CO., LTD.
  • Current Assignee Address: KR Chungcheongnam-do
  • Agency: RatnerPrestia
  • Priority: KR10-2018-0125846 20181022
  • Main IPC: G03F7/20
  • IPC: G03F7/20
Guide pin, photo mask supporting unit including the same, and photo mask cleaning apparatus including the same
Abstract:
Provided are a guide pin configured to support a corner of a photo mask using a double slide structure, a photo mask supporting unit including the same, and a photo mask cleaning apparatus including the same. The photo mask supporting unit includes a supporting plate, a supporting shaft which supports the supporting plate from under the supporting plate, a supporting plate driver configured to rotate the supporting plate, and a guide pin provided as a plurality of guide pins on the supporting plate to support a photo mask and including at least one column protruding upward from a flat surface and having a first sliding portion and a second sliding portion formed on a side surface of the column to be inclined downward to have different angles.
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