Invention Grant
- Patent Title: Guide pin, photo mask supporting unit including the same, and photo mask cleaning apparatus including the same
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Application No.: US16658215Application Date: 2019-10-21
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Publication No.: US10955758B2Publication Date: 2021-03-23
- Inventor: Shi Hyun Park
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Chungcheongnam-do
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-do
- Agency: RatnerPrestia
- Priority: KR10-2018-0125846 20181022
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
Provided are a guide pin configured to support a corner of a photo mask using a double slide structure, a photo mask supporting unit including the same, and a photo mask cleaning apparatus including the same. The photo mask supporting unit includes a supporting plate, a supporting shaft which supports the supporting plate from under the supporting plate, a supporting plate driver configured to rotate the supporting plate, and a guide pin provided as a plurality of guide pins on the supporting plate to support a photo mask and including at least one column protruding upward from a flat surface and having a first sliding portion and a second sliding portion formed on a side surface of the column to be inclined downward to have different angles.
Information query
IPC分类: