Invention Grant
- Patent Title: Vertical field effect transistor having two-dimensional channel structure
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Application No.: US16845591Application Date: 2020-04-10
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Publication No.: US10957795B2Publication Date: 2021-03-23
- Inventor: Yong Hee Park , Myung Gil Kang , Young-Seok Song , Keon Yong Cheon
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/10 ; H01L29/08 ; H01L29/06 ; H01L29/66 ; H01L27/12

Abstract:
A vertical field effect transistor (VFET) including a first source/drain region, a channel structure upwardly protruding from the first source/drain region and configured to serve as a channel, the channel structure having a two-dimensional structure in a plan view, the channel structure having an opening at at least one side thereof, the channel structure including one or two first portions and one or more second portions, the one or two first portion extending in a first direction, and the one or more second portions connected to corresponding one or more of the one or more first portions and extending in a second direction, the second direction being different from the first direction, a gate structure horizontally surrounding the channel structure, and a second source/drain region upwardly on the channel structure may be provided.
Public/Granted literature
- US20200243682A1 VERTICAL FIELD EFFECT TRANSISTOR HAVING TWO-DIMENSIONAL CHANNEL STRUCTURE Public/Granted day:2020-07-30
Information query
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