Invention Grant
- Patent Title: Positioning device, lithographic apparatus, method for compensating a balance mass torque and device manufacturing method
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Application No.: US16959738Application Date: 2018-11-29
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Publication No.: US10962890B2Publication Date: 2021-03-30
- Inventor: Wilhelmus Franciscus Johannes Simons , Dave Braaksma , Hans Butler , Hendrikus Herman Marie Cox , René Wilhelmus Antonius Hubertus Leenaars , Stephan Christiaan Quintus Libourel , Martinus Van Duijnhoven , Maurice Willem Jozef Etiënne Wijckmans
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP18150247 20180104
- International Application: PCT/EP2018/082983 WO 20181129
- International Announcement: WO2019/134776 WO 20190711
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.
Information query
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