Invention Grant
- Patent Title: System, method for training and applying defect classifiers in wafers having deeply stacked layers
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Application No.: US15863753Application Date: 2018-01-05
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Publication No.: US10964013B2Publication Date: 2021-03-30
- Inventor: Martin Plihal , Ankit Jain
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Zilka-Kotab, P.C.
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06T7/00 ; G06K9/20 ; G06K9/62 ; G06T7/70

Abstract:
A system, method, and non-transitory computer readable medium are provided for training and applying defect classifiers in wafers having deeply stacked layers. In use, a plurality of images generated by an inspection system for a location of a defect detected on a wafer by the inspection system are acquired. The location on the wafer is comprised of a plurality of stacked layers, and each image of the plurality of images is generated by the inspection system at the location using a different focus setting. Further, a classification of the defect is determined, utilizing the plurality of images.
Public/Granted literature
- US20180204315A1 SYSTEM, METHOD FOR TRAINING AND APPLYING DEFECT CLASSIFIERS IN WAFERS HAVING DEEPLY STACKED LAYERS Public/Granted day:2018-07-19
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