Invention Grant
- Patent Title: Defect detecting method and defect detecting system
-
Application No.: US15884305Application Date: 2018-01-30
-
Publication No.: US10964014B2Publication Date: 2021-03-30
- Inventor: Chien-Huei Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G01N21/88 ; G03F7/20 ; G01N21/956

Abstract:
A defect detecting method, a defect detecting system, and a non-transitory computer-readable medium are provided. The defect detecting method includes applying a rank filter to multiple scan images of consecutive dies of a reference wafer scanned by a wafer inspection tool to obtain multiple reference die images; collecting multiple target die images of a target die of a target wafer scanned by the wafer inspection tool; comparing the target die images with the reference die images to detect multiple defects according to differences of pixel values of corresponding pixels in the target die images and the reference die images; and excluding multiple common defects from the detected defects to detect at least one mask defect printed on the target wafer, where the common defects are obtained by the wafer inspection tool performing a wafer inspection on the target wafer.
Public/Granted literature
- US20190130551A1 DEFECT DETECTING METHOD, DEFECT DETECTING SYSTEM AND COMPUTER-READABLE MEDIUM Public/Granted day:2019-05-02
Information query