A scanning microelectromechanical reflector system comprising a reflector with a reflector body, a first cavity vertically aligned with the reflector body above the device plane and a second cavity vertically aligned with the reflector body below the device plane. The reflector also comprises a central attachment point located within a central opening in the reflector body. One or more flexures extend from the sidewalls of the central opening to the central attachment point. The flexures allow the central attachment point to remain stationary in the device plane when actuator units tilt the reflector body out of the device plane. The reflector system comprises a central support structure which extends through the cavity to the central attachment point of the reflector.