- Patent Title: Apparatus and method for developing a photoresist coated substrate
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Application No.: US16913886Application Date: 2020-06-26
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Publication No.: US10969682B2Publication Date: 2021-04-06
- Inventor: Tzung-Shiun Liu , Chun-Lang Chen , Ching-Yueh Chen
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McDermott Will & Emery LLP
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/09 ; G03F7/32 ; G03F1/50 ; G03F7/30

Abstract:
An apparatus includes a developing tank, and the developing tank has a sidewall and a bottom. A fluid manifold is adjacent the bottom of the developing tank. The fluid manifold includes a plurality of holes and a plurality of valves. Developer and rinsing fluid flow through the plurality of holes. Each of the plurality of the valves corresponds to a different hole of the plurality of holes, and the plurality of valves allow the developer and the rinsing fluid to flow through the holes when open and prevent the developer and the flowing liquid from flowing through the holes when closed. The developer flows through a developer inlet to the fluid manifold. The rinsing fluid flows through a rinsing fluid inlet to the fluid manifold. A controller is configured to individually control opening and closing of each of the plurality of valves.
Public/Granted literature
- US20200326622A1 APPARATUS AND METHOD FOR DEVELOPING A PHOTORESIST COATED SUBSTRATE Public/Granted day:2020-10-15
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