Invention Grant
- Patent Title: Pellicle attachment apparatus
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Application No.: US16572156Application Date: 2019-09-16
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Publication No.: US10969701B2Publication Date: 2021-04-06
- Inventor: Frits Van Der Meulen , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Derk Servatius Gertruda Brouns , Marc Bruijn , Jeroen Dekkers , Paul Janssen , Ronald Harm Gunther Kramer , Matthias Kruizinga , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Gerrit Van Den Bosch , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge , Angelo Cesar Peter De Klerk , Jacobus Maria Dings , Maurice Leonardus Johannes Janssen , Roland Jacobus Johannes Kerstens , Martinus Jozef Maria Kester , Michel Loos , Geert Middel , Silvester Matheus Reijnders , Frank Johannes Christiaan Theuerzeit , Anne Johannes Wilhelmus Van Lievenoogen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F1/64
Abstract:
Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Public/Granted literature
- US20200012204A1 Pellicle Attachment Apparatus Public/Granted day:2020-01-09
Information query
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