Invention Grant
- Patent Title: High frequency antenna and plasma processing device
-
Application No.: US16797147Application Date: 2020-02-21
-
Publication No.: US10971334B2Publication Date: 2021-04-06
- Inventor: Yuta Sugimoto , Masashi Yamage
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Minato-ku
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2019-149796 20190819
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
A high-frequency antenna of an embodiment is installed on a window of a chamber, and includes first and second antenna elements and first and second relaying portions. The first antenna element extends over a first angle range in a circumferential direction, and the second antenna element extends in the circumferential direction over a second angle range deviating from the first angle range. The second antenna element is arranged away from the window compared to the first antenna element, and is arranged on the outer peripheral side from the first antenna element. The first relaying portion extends toward the side away from the window from the first antenna element, and the second relaying portion extends toward the outer peripheral side, from the first relaying portion to the second antenna element.
Public/Granted literature
- US20210057184A1 HIGH FREQUENCY ANTENNA AND PLASMA PROCESSING DEVICE Public/Granted day:2021-02-25
Information query