Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16086221Application Date: 2017-04-12
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Publication No.: US10971655B2Publication Date: 2021-04-06
- Inventor: Hyung Jo Park
- Applicant: LG INNOTEK CO., LTD.
- Applicant Address: KR Seoul
- Assignee: LG INNOTEK CO., LTD.
- Current Assignee: LG INNOTEK CO., LTD.
- Current Assignee Address: KR Seoul
- Agency: Ked & Associates, LLP
- Priority: KR10-2016-0044566 20160412
- International Application: PCT/KR2017/003965 WO 20170412
- International Announcement: WO2017/179908 WO 20171019
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/40 ; H01L31/0216 ; H01L31/0224 ; H01L31/0232 ; H01L31/0304 ; H01L33/32 ; H01L33/44

Abstract:
One embodiment provides a semiconductor device comprising: a substrate; a first semiconductor layer disposed on the substrate; a second semiconductor layer disposed on the first semiconductor layer; a third semiconductor layer disposed on the second semiconductor layer; and a reflective layer disposed on the third semiconductor layer, wherein the part between the first and second semiconductor layers, the part between the third and second semiconductor layers, and the second semiconductor layer comprise a depletion region, and the conductivity of the first semiconductor layer and the conductivity of the third semiconductor layer are different from each other, and the second semiconductor layer comprises an intrinsic semiconductor layer.
Public/Granted literature
- US20200295230A1 SEMICONDUCTOR DEVICE Public/Granted day:2020-09-17
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