Invention Grant
- Patent Title: Salt and photoresist composition containing the same
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Application No.: US16156240Application Date: 2018-10-10
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Publication No.: US10975028B2Publication Date: 2021-04-13
- Inventor: Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: JPJP2017-200835 20171017
- Main IPC: G03F7/40
- IPC: G03F7/40 ; C07C381/12 ; C07C309/19 ; G03F7/004 ; G03F7/039 ; C07C309/17 ; C07D339/08 ; C07D317/72 ; C07D319/08
Abstract:
A salt comprising a group represented by the formula (aa): wherein Xa and Xb independently each represent an oxygen atom or a sulfur atom, and X1 represents a C1-C12 saturated hydrocarbon group which has a moiety represented by formula (1a) or (2a):
Public/Granted literature
- US20190112265A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME Public/Granted day:2019-04-18
Information query
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