Invention Grant
- Patent Title: Atomic force microscopy device, method and lithographic system
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Application No.: US16477820Application Date: 2018-01-12
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Publication No.: US10976345B2Publication Date: 2021-04-13
- Inventor: Abbas Mohtashami , Maarten Hubertus van Es , Hamed Sadeghian Marnani
- Applicant: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Applicant Address: NL s-Gravenhage
- Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Current Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Current Assignee Address: NL s-Gravenhage
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: EP17151418 20170113
- International Application: PCT/NL2018/050023 WO 20180112
- International Announcement: WO2018/132007 WO 20180719
- Main IPC: G01Q60/30
- IPC: G01Q60/30 ; G01N29/06 ; G01Q10/06 ; G01Q20/02 ; G01Q60/38

Abstract:
An atomic force microscopy device arranged for determining sub-surface structures in a sample comprises a scan head with a probe including a flexible carrier and a probe tip arranged on the flexible carrier. Therein an actuator applies an acoustic input signal to the probe and a tip position detector measures a motion of the probe tip relative to the scan head during scanning, and provides an output signal indicative of said motion, to be received and analyzed by a controller. At least an end portion of the probe tip tapers in a direction away from said flexible carrier towards an end of the probe tip. The end portion has a largest cross-sectional area Amax at a distance Dend from said end, the square root of the largest cross-sectional area Amax is at least 100 nm and the distance Dend is in the range of 0.2 to 2 the value of said square root.
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