Invention Grant
- Patent Title: Sulfonic acid derivative compounds as photoacid generators in resist applications
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Application No.: US15746895Application Date: 2016-08-11
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Publication No.: US10976658B2Publication Date: 2021-04-13
- Inventor: Yongqiang Zhang , Darin Campo , Ram B. Sharma , Martin Kunz
- Applicant: Heraeus Epurio LLC
- Applicant Address: US OH Vandalia
- Assignee: Heraeus Epurio LLC
- Current Assignee: Heraeus Epurio LLC
- Current Assignee Address: US OH Vandalia
- Agency: Stradley Ronon Stevens & Young, LLP
- International Application: PCT/US2016/046541 WO 20160811
- International Announcement: WO2017/034814 WO 20170302
- Main IPC: C07D221/14
- IPC: C07D221/14 ; G03F7/004 ; G03F7/038 ; G03F7/039 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/38
Abstract:
Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
Public/Granted literature
- US20200089110A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS Public/Granted day:2020-03-19
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