Invention Grant
- Patent Title: Semiconductor processing device
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Application No.: US16045786Application Date: 2018-07-26
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Publication No.: US10978316B2Publication Date: 2021-04-13
- Inventor: Satoshi Nakaoka , Tomohiko Sugita , Shinsuke Kimura , Hiroaki Ashidate , Katsuhiro Sato
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2018-028997 20180221
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/673 ; H01L21/677 ; B08B3/10 ; B08B3/08
Abstract:
A semiconductor processing device according to an embodiment includes a processing tank configured to store a chemical therein to allow a semiconductor substrate to be immersed in the chemical. A gas supply part is provided below the semiconductor substrate accommodated in the processing tank and is configured to supply air bubbles to the chemical from below the semiconductor substrate. A chemical supply part is provided above the gas supply part and below the semiconductor substrate and is configured to discharge the chemical caused to circulate from the processing tank, towards the air bubbles appearing from the gas supply part.
Public/Granted literature
- US20190259639A1 SEMICONDUCTOR PROCESSING DEVICE Public/Granted day:2019-08-22
Information query
IPC分类:
