Invention Grant
- Patent Title: Transfer device, substrate processing apparatus, and transfer method
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Application No.: US16112941Application Date: 2018-08-27
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Publication No.: US10978322B2Publication Date: 2021-04-13
- Inventor: Ao Zheng , Koyu Hasegawa , Moriyoshi Kinoshita
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JPJP2017-165153 20170830,JPJP2018-119129 20180622
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/677 ; H01L21/673

Abstract:
A transfer device of an embodiment includes a transporter including a temperature sensor disposed thereon and configured to move between a measurement position at which a temperature of a transfer target object is measured and a standby position separated from the measurement position, and a controller configured to control an operation of the transporter, and the controller moves the transporter between the measurement position and the standby position, and transfers the transfer target object by the transporter when the temperature measured by the temperature sensor at the measurement position continues to be equal to or less than a threshold for a first time.
Public/Granted literature
- US20190067055A1 TRANSFER DEVICE, SUBSTRATE PROCESSING APPARATUS, AND TRANSFER METHOD Public/Granted day:2019-02-28
Information query
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