Invention Grant
- Patent Title: Vacuum processing device
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Application No.: US16004906Application Date: 2018-06-11
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Publication No.: US10994938B2Publication Date: 2021-05-04
- Inventor: Hirotoshi Nakao
- Applicant: ULVAC, Inc.
- Applicant Address: JP Chigasaki
- Assignee: ULVAC, Inc.
- Current Assignee: ULVAC, Inc.
- Current Assignee Address: JP Chigasaki
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JPJP2015-246779 20151217
- Main IPC: B65G17/12
- IPC: B65G17/12 ; C23C14/34 ; B65G17/32 ; C23C14/50 ; C23C14/56 ; H01L21/677 ; H01L21/67 ; B65G49/06

Abstract:
The present invention provides a technique to enable sufficient space saving in a transit-type vacuum processing device. The vacuum processing device 1 of the present invention has: a vacuum chamber 2 where a single vacuum ambience is formed; first and second processing regions 4 and 5 that are provided in the vacuum chamber 2 and have a processing source that performs processing on a planar process surface of a substrate 10; and a conveyance drive member 33 that forms a conveyance path for conveying the substrate 10 so as to pass through the first and second processing regions 4 and 5. The conveyance path is formed as a single annular path when the conveyance path is projected onto a plane (vertical plane) containing: a normal line of an arbitrary point on a process surface of the substrate 10 conveyed through the conveyance path, and a trajectory line drawn by the arbitrary point on the process surface of the substrate 10 when the substrate 10 passes straight through the first and second processing regions 4 and 5.
Public/Granted literature
- US20180370733A1 VACUUM PROCESSING DEVICE Public/Granted day:2018-12-27
Information query
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