Invention Grant
- Patent Title: Device for the plasma-supported treatment of liquids
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Application No.: US16391459Application Date: 2019-04-23
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Publication No.: US10995018B2Publication Date: 2021-05-04
- Inventor: Klaus-Dieter Weltmann , Ronny Brandenburg , Manfred Stieber , Stefan Horn , Michael Schmidt , Thomas Von Woedtke , Jörn Winter
- Applicant: Leibniz-Institut für Plasmaforschung und Technologie e.V.
- Applicant Address: DE Greifswald
- Assignee: Leibniz-Institut für Plasmaforschung und Technologie e.V.
- Current Assignee: Leibniz-Institut für Plasmaforschung und Technologie e.V.
- Current Assignee Address: DE Greifswald
- Agency: JMB Davis Ben-David
- Priority: EP18168814 20180423
- Main IPC: C02F1/46
- IPC: C02F1/46 ; C02F1/461 ; H01J37/32 ; C02F1/32 ; C02F1/72 ; C02F1/78

Abstract:
The invention relates to a device (10) for treating a liquid with a plasma, wherein the device (10) has a high-voltage electrode (20) as well as a liquid-permeable ground electrode device (30). The ground electrode device (30) has a flat, conductive region (32) and a porous region (34) arranged on the flat, conductive region (32), wherein the conductive region (32) is liquid-permeable along its flat extension. A discharge space (40) is formed between the ground electrode device (30) and the high-voltage electrode (20). A first dielectric (50) is arranged on the high-voltage electrode (20) so that a plasma can be generated in the discharge space (40) by means of a dielectric barrier discharge. Moreover, the device (10) has an initial flow volume (60) into which the liquid (12) can be conducted, and that is surrounded by a wall (62). At least in a first region, the wall (62) of the initial flow volume (60) has the ground electrode device (30) such that the initial flow volume (60) is connected to the discharge space (40) in a liquid permeable manner via the ground electrode device (30).
Public/Granted literature
- US20190322550A1 DEVICE FOR THE PLASMA-SUPPORTED TREATMENT OF LIQUIDS Public/Granted day:2019-10-24
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