Invention Grant
- Patent Title: Composition and pattern-forming method
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Application No.: US16385341Application Date: 2019-04-16
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Publication No.: US10995173B2Publication Date: 2021-05-04
- Inventor: Yuji Namie , Shinya Minegishi , Tomoki Nagai , Takuo Sone
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Element IP, PLC
- Priority: JP2011-245991 20111109,JP2012-180689 20120816
- Main IPC: C08F297/02
- IPC: C08F297/02 ; B81C1/00 ; C08L53/00 ; H01L21/308 ; H01L21/3213 ; H01L21/033 ; G03F7/00 ; G03F7/20 ; H01L21/027
Abstract:
A directed self-assembling composition for pattern formation includes a block copolymer. The block copolymer includes a polystyrene block having a styrene unit, and a polyalkyl (meth)acrylate block having an alkyl (meth)acrylate unit. The block copolymer has a group that is bound to at least one end of a main chain of the block copolymer and that includes a hetero atom.
Public/Granted literature
- US20190241695A1 COMPOSITION AND PATTERN-FORMING METHOD Public/Granted day:2019-08-08
Information query
