Invention Grant
- Patent Title: Deposition of molybdenum thin films using a molybdenum carbonyl precursor
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Application No.: US15999499Application Date: 2017-02-17
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Publication No.: US10995405B2Publication Date: 2021-05-04
- Inventor: Charles Dezelah , Jean-Sebastien Lehn , Guo Liu , Mark C. Potyen
- Applicant: Merck Patent GmbH
- Applicant Address: DE Darmstadt
- Assignee: Merck Patent GmbH
- Current Assignee: Merck Patent GmbH
- Current Assignee Address: DE Darmstadt
- Agency: Harness Dickey & Pierce P.L.C.
- International Application: PCT/US2017/018455 WO 20170217
- International Announcement: WO2017/143246 WO 20170824
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/16
Abstract:
Transition metal precursors are disclosed herein along with methods of using these precursors to deposit metal thin films. Advantageous properties of these precursors and methods are also disclosed, as well as superior films that can be achieved with the precursors and methods.
Public/Granted literature
- US20190003050A1 Deposition of Molybdenum Thin Films Using A Molybdenum Carbonyl Precursor Public/Granted day:2019-01-03
Information query
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