Invention Grant
- Patent Title: Methods and apparatus for gallium nitride deposition
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Application No.: US16427812Application Date: 2019-05-31
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Publication No.: US10995419B2Publication Date: 2021-05-04
- Inventor: Brian H. Burrows , Ala Moradian , Kartik Shah , Shu-Kwan Lau
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: C30B25/02
- IPC: C30B25/02 ; C30B25/14 ; H01L21/02 ; C23C16/455 ; C23C16/30 ; C30B29/40

Abstract:
Embodiment disclosed herein include a liner assembly, comprising an injector plate liner, a gas injector liner coupled to the injector plate liner, an upper process gas liner coupled to the gas injector liner, a lower process gas liner coupled to the upper process gas liner, and an injector plate positioned between the injector plate liner and the upper process gas liner, wherein a cooling fluid channel is formed in the injector plate adjacent to the gas injector liner.
Public/Granted literature
- US20200332437A1 METHODS AND APPARATUS FOR GALLIUM NITRIDE DEPOSITION Public/Granted day:2020-10-22
Information query
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