Invention Grant
- Patent Title: Sensor for gate leakage detection
-
Application No.: US16186623Application Date: 2018-11-12
-
Publication No.: US10996261B2Publication Date: 2021-05-04
- Inventor: Hyunwoo Park , Youn Sung Choi , Stanley Seungchul Song
- Applicant: QUALCOMM Incorporated
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM Incorporated
- Current Assignee: QUALCOMM Incorporated
- Current Assignee Address: US CA San Diego
- Agency: Withrow & Terranova, PLLC
- Main IPC: G01R31/26
- IPC: G01R31/26

Abstract:
Aspects generally relate methods and apparatuses of gate leakage detection of a transistor. A gate pad is coupled to a gate of a MOS transistor. A gate leakage detection circuit is coupled to the gate pad, wherein the gate leakage detection circuit is configured to estimate a gate leakage current. Based on the estimated gate leakage current determining a quality of a gate fabrication process.
Public/Granted literature
- US20200049757A1 SENSOR FOR GATE LEAKAGE DETECTION Public/Granted day:2020-02-13
Information query