Invention Grant
- Patent Title: Metal detection apparatus
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Application No.: US16487172Application Date: 2018-05-22
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Publication No.: US10996363B2Publication Date: 2021-05-04
- Inventor: Yuki Hayakawa , Eiji Taniguchi , Akira Ohashi , Tomohiko Yamaguchi
- Applicant: ANRITSU INFIVIS CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: ANRITSU INFIVIS CO., LTD.
- Current Assignee: ANRITSU INFIVIS CO., LTD.
- Current Assignee Address: JP Kanagawa
- Agency: Pearne & Gordon LLP
- Priority: JPJP2017-104099 20170526
- International Application: PCT/JP2018/019720 WO 20180522
- International Announcement: WO2018/216702 WO 20181129
- Main IPC: G01V3/10
- IPC: G01V3/10 ; G01N27/72

Abstract:
A metal detection apparatus comprises: a detection circuit unit (30) that detects a first variation component having a large influence of workpiece and a second variation component having a large influence of metal; a determination unit (40) that compares the two variation components to perform a metal determination process in the workpiece (W); and a detection condition adjustment unit (60) that adjusts detection conditions of both variation components. A foreign matter waveform storage unit (50) stores a test variation component accompanying temporal change due to metal influence is further provided. The detection condition adjustment unit sets a specific processing condition of detection processing in the detection circuit unit based on the first variation component based on the magnetic field variation signal at the time when the work W including no metal passes through the inspection zone Z and the second variation component constituted by the test variation component.
Public/Granted literature
- US20200073007A1 METAL DETECTION APPARATUS Public/Granted day:2020-03-05
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