Invention Grant
- Patent Title: Method and structure for nanoimprint lithography masks using optical film coatings
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Application No.: US16160479Application Date: 2018-10-15
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Publication No.: US10996562B2Publication Date: 2021-05-04
- Inventor: Thomas E. Seidel
- Applicant: Thomas E. Seidel
- Applicant Address: US FL Palm Coast
- Assignee: Thomas E. Seidel
- Current Assignee: Thomas E. Seidel
- Current Assignee Address: US FL Palm Coast
- Agency: Ascenda Law Group, PC
- Main IPC: B29C43/00
- IPC: B29C43/00 ; B29C59/00 ; B29C59/02 ; G03F7/00
Abstract:
Structures and associated methods for making smaller physical feature sizes for masks used in imprint lithography for application to patterning for advanced semiconductor and data storage devices.
Public/Granted literature
- US20190049839A1 METHOD AND STRUCTURE FOR NANOIMPRINT LITHOGRAPHY MASKS USING OPTICAL FILM COATINGS Public/Granted day:2019-02-14
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