- Patent Title: Substrate processing apparatus, article manufacturing method, substrate processing method, substrate processing system, management apparatus, and storage medium
-
Application No.: US16830753Application Date: 2020-03-26
-
Publication No.: US10996574B2Publication Date: 2021-05-04
- Inventor: Takahiro Takiguchi , Shinichiro Koga
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JPJP2019-079564 20190418
- Main IPC: G03F9/00
- IPC: G03F9/00

Abstract:
A substrate processing apparatus is provided. The apparatus includes an imaging unit that images a mark on a substrate, and a processor that aligns the substrate based on an image of the mark obtained by the imaging unit. If the alignment has failed, the processor identifies a factor of the failure based on information including the image and executes at least one of a plurality of recovery processes based on the identified factor. The processor includes an output unit that outputs a condition for the at least one of recovery processes in accordance with an inference model, and a learning unit that learns the inference model based on an execution result of the at least one of the recovery processes under the condition output from the output unit.
Public/Granted literature
Information query