Invention Grant
- Patent Title: Laser annealing process of drive backplane and mask
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Application No.: US16569311Application Date: 2019-09-12
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Publication No.: US10998189B2Publication Date: 2021-05-04
- Inventor: Feng Guan , Zhi Wang , Chen Xu
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Thomas | Horstemeyer, LLP
- Priority: CN201910107922.5 20190202
- Main IPC: H01L21/02
- IPC: H01L21/02 ; B23K26/06 ; H01L21/306 ; H01L23/544 ; H01L27/12 ; B23K26/354
Abstract:
A laser annealing process of a drive backplane includes: providing a mask, which has a light transmission area; and sequentially moving the mask to cover different areas of an amorphous silicon layer of the drive backplane, and annealing the amorphous silicon layer exposed in the light transmission area to form a poly-silicon pattern.
Public/Granted literature
- US20200251327A1 LASER ANNEALING PROCESS OF DRIVE BACKPLANE AND MASK Public/Granted day:2020-08-06
Information query
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