Invention Grant
- Patent Title: Substrate holding/rotating device, substrate processing apparatus including the same, and substrate processing method
-
Application No.: US15901960Application Date: 2018-02-22
-
Publication No.: US10998220B2Publication Date: 2021-05-04
- Inventor: Hiroaki Ishii , Ryo Muramoto
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Ostrolenk Faber LLP
- Priority: JPJP2017-060022 20170324
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/67 ; H01L21/306

Abstract:
The substrate holding/rotating device includes a plurality of movable pins each having a support portion in contact with a peripheral edge portion of the substrate to support the substrate, and a rotation unit which rotates the plurality of movable pins around the rotation axis, a support portion of each of the movable pins included in a first pin group is disposed so as to move between a first hold position included hold positions, the first hold position close to a rotation axis and a second hold position included the hold positions, the second hold position far apart from the first hold position to one in a circumferential direction and also so as to move between the first and second hold positions and an open position far apart from the rotation axis.
Public/Granted literature
Information query
IPC分类: