Invention Grant
- Patent Title: Mechanically stable complementary field effect transistors
-
Application No.: US16292801Application Date: 2019-03-05
-
Publication No.: US10998233B2Publication Date: 2021-05-04
- Inventor: Ruilong Xie , Alexander Reznicek , Chun-Chen Yeh , Chen Zhang
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Tutunjian & Bitetto, P.C.
- Agent L. Jeffrey Kelly
- Main IPC: H01L21/70
- IPC: H01L21/70 ; H01L21/8238 ; H01L21/822 ; H01L21/306 ; H01L29/66 ; H01L27/092 ; H01L21/3105 ; H01L29/06 ; H01L29/423 ; H01L21/02 ; H01L29/49

Abstract:
A method is presented for constructing mechanically stable fins. The method includes forming a fin stack including a plurality of sacrificial layers, recessing the fin stack to form channel fins, depositing a first type epitaxy between the channel fins, depositing a dielectric region over the first type epitaxy, depositing a second type epitaxy over the dielectric region, and removing the plurality of sacrificial layers resulting in formation of a plurality of gaps. The method further includes filling a first set of the plurality of gaps with a p-type work function metal (WFM) to form a p-type field effect transistor (pFET) structure and filling a second set of the plurality of gaps with an n-type WFM to form an n-type field effect transistor (nFET) structure, where the nFET structure is stacked over the pFET structure.
Public/Granted literature
- US20200286788A1 MECHANICALLY STABLE COMPLEMENTARY FIELD EFFECT TRANSISTORS Public/Granted day:2020-09-10
Information query
IPC分类: