- Patent Title: Single crystalline extrinsic bases for bipolar junction structures
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Application No.: US16563102Application Date: 2019-09-06
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Publication No.: US10998419B2Publication Date: 2021-05-04
- Inventor: Pouya Hashemi , Tak Ning , Jeng-Bang Yau , Alexander Reznicek
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L21/265 ; H01L21/306 ; H01L21/285 ; H01L29/737 ; H01L21/02 ; H01L29/04 ; H01L29/10 ; H01L29/165 ; H01L29/45

Abstract:
Bipolar junction transistor structures and methods for making the same are provide. The method includes: providing a substrate with an insulator layer and a device layer over the insulator layer, forming an intrinsic base from the device layer, forming emitter and collector regions from the device layer, and after forming i) the intrinsic base and ii) the emitter and collector regions, depositing a single crystalline extrinsic base over the intrinsic base.
Public/Granted literature
- US20200066876A1 SINGLE CRYSTALLINE EXTRINSIC BASES FOR BIPOLAR JUNCTION STRUCTURES Public/Granted day:2020-02-27
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